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Optical Pyrometer Semiconductor

BASF EXACTUS®optical pyrometers provide critical semiconductor process temperature information that drives better process yields and increases profitability. Exactus technology stands out because of its industry leading capabilities.

Low temperatures (25ºC and higher) are measured using short wavelengths. EXACTUS® probes deliver high precision, with resolution up to 0.001ºC, accuracy of 1.5ºC and extremely low measurement drift. With speeds up to 1,000 readings per second, and a broad dynamic range at any given wavelength, Exactus temperature measurement solutions are well suited for the semiconductor industry.

BASF’s innovative technology offers numerous advantages in controlling wafer-to-wafer uniformity in both temperature and film thickness. The highly sensitive electronics and advanced optics mean shorter wavelength detectors can be used to measure radiant energy. This decreases errors from both wafer transmission and emissivity. Compact size and digital output allow Exactus sensors to be placed directly on or around a process tool, eliminating the need for fiber cables and improving process repeatability. Fiber cables are a primary source of measurement errors. In addition, the instrument’s high speed and high resolution provide better control and noise suppression. The result is better monitoring of wafer temperature and improved process results.